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Tescan Amber FIB-SEM

Information

The Tescan Amber FIBSEM has two columns; a 1kV - 30 kV electron column with a Field Emission Gun enabling the taking of high resolution (1.5nm) Scanning Electron Microscopy images (SEM), a 0.5kV - 30 kV ion column with a Ga+ ion source to allow focused ion beam (FIB) cutting and imaging of samples and a multiple Gas Injector System (GIS) for depositing a variety of different materials. There is also an Oxford Instruments EDS system to enable elemental analysis and element mapping of samples.

The FIB allows for very precise cutting of samples, with the SEM able to image the process in real time to give good control. A micromanipulator is also available to allow the user to pick up small sample objects.

This opens up many possibilities, including picking up individual particles a few micrometers in size, making a TEM specimen from a specific site with nm precision to obtaining a model system through repeated cutting and imaging.

Specification

FIB
  • FIB resolution of 2.5 nm at 30 keV
  • Accelerating voltage 0.5 to 30 kV
  • Magnification 30 to 300000x
  • Probe current: < 1 pA–100 nA
SEM
  • 1.5 nm at 1 keV
  • 0.9 nm at 15 keV
  • Accelerating voltage 50V to 30 kV
  • Dual in-column SE and BSE detection
EDS

Oxford Instruments Aztec system

Example Images

 

 

 

 

Reference Publications