Moorfield magnetron sputtering system
MoorfieldnanoPVD-S10A is a benchtop magnetron sputtering systemwith RF power supplies for deposition of metals or insulating materials such as oxides or nitrides.
Key features
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3 magnetrons are water-cooled, allowing for high powers and sustained operation, and sized for accepting industry-standard 50mm diameter targets. The vacuum chamber is equipped with Edwards turbomolecular pumping systems for low-contamination operation. Co-deposition is possible, as is reactive sputtering via the gas/pressure control module that support up to 3 process gases. Chamber access is via a hinged lid, that opens to reveal a stage suitable for holding substrates up to 100mm diameter. Base pressures <5 × 10-7mbar Gases: Ar and N2 Targets: Ag, Al, Au, Cr, Co, CoFeB, Cu, Mn, Nb, Ni, NiCr, Pt, Ti Target 1: PtTarget 2: AuTarget 3: interchangeable |
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