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Focussed Ion Beam Lithography (FIB)

Focused Ion Beam, also known as FIB, is a technique used particularly in the semiconductor and materials science fields for site-specific analysis, deposition, and ablation of materials.

cogsHow does it work?

An FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM). However, while the SEM uses a focused beam of electrons to image the sample in the chamber, an FIB setup instead uses a focused beam of ions.

FIB can also be incorporated in a system with both electron and ion beam columns, allowing the same feature to be investigated using either of the beams. FIB should not be confused with using a beam of focused ions for direct write lithography (such as in proton beam writing), where the material is modified by different mechanisms.


TEM sample preparation; photolithography; defect analysis; etching; polishing and thinning.

Sample Handling Requirements:

Solid <150mm side dimensions.

Complementary Techniques:

Ion Polishing, SEM, TEM, AFM, STM.

Warwick capability:



Claire Gerard: c dot gerard at warwick dot ac dot uk / 07385 145064

FIB equipment

Typical results format, and sample:

FIB image


Warwick collect/analyse data

Warwick collect data
 green_tick.gif Available to user with expertise/ contribution
Spare capacity for collaborative research