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Nano Fabrication RTP

Lithography

Within the cleanroom is a 40 m2 lithography area, illuminated with yellow light to enable the use of photoresist. Positive and negative photoresists are used in the laboratory, which is also equipped for bi-level resist processes.

Coating

  • Spin 150 manual resist spin coater. Supports 0.5cm square to 6" diameter substrates.
  • Laurell WS-650Mz auto dispense spin coaster. Supports 2-6" diameter substrates.
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pipette_coating

Exposure

  • Suss Microtec MJB3 manual mask aligner. Supports 0.5cm square to 3" diameter substrates with a 1.5 µm resolution

  • Suss Microtec MA/BA8 mask aligner with SCIL (surface conformal imprint lithography) adaptation. Supports 1cm square to 8" diameter substrates with a 0.75 µm resolution.

  • SCIL processing on 2" and 3" diameter substrates to define features down to 50nm.

ma8_mask_aligner
mask_inspection

Develop

  • Manual glassware development for small and irregular substrates.
  • Laurell EDC-650Hz spin developer for 2-3" diameter substrates.
development_bench_blow_dry
  • Monmouth Scientific Circulaire T1400 filtration fume cupboard with carbon filter(Processing materials for lithographyonly)
  • x2 hotplates
  • Laurell spincoater WS-650Mz-8NPPB
  • Ultrasonic bath
  • High purity N2 gas
  • DI water

Permitted substances:

1)Photoresists

2)Photoresists’ primers

3)Photoresists’ developers

4)Photoresists’ strippers

5)Acetone

6)Ethanol

7)IPA

8)DI water

Lithography Fume Cupboard

Primers, photoresists, developers and removers:

  
A new user training: Mike Crosby and Alan Burton
Technical support: Mike Crosby and Alan Burton

Risk assessment

Risk Assessment for Returning to Work during the Covid-19 Lockdown Easing PeriodLink opens in a new windowLink opens in a new windowLink opens in a new window

All usersof any fume cupboard are required to complete the moodle training course (https://moodle.warwick.ac.uk/course/view.php?id=38253) and their competency recorded on an approved user list.

Heidelberg Instruments μPG 101is an extremely economical and easy to use micro pattern generator for direct writing applications and low volume mask making. The system can be used for applications such as MEMS, Bio MEMS, Integrated Optics, Micro Fluidics or any other application that requires high precision, high-resolution microstructures.

The tabletop system features exchangeable write modes to meet the resolution and write speed requirements of specific application. It is a lithography system, which can produce sub-micron features. The small address grid allows placement of structures with very high accuracy. The real-time autofocus system monitors and corrects focus position during exposure, which guarantees high resolution and repeatability over the entire exposure area. Small address grid and real-time autofocus system are essential features for a professional micro pattern solution.

Applications for the µPG 101 include Semiconductors, Life Science, MEMS, Sensors, Actuators, Material Research, and any other application that requires microstructures.

 uPG101

Key features

  • Write speed up to 90 mm²/ min
  • Substrates up to 150 mm x 150 mm
  • Structures down to 0.6 µm
  • UV (375 nm, 70 mW) diode laser source
  • Write Mode Mix and Match
  • Optical Autofocus
  • Multiple data input formats
  • Basic gray scale exposure mode
  • Camera system for alignment
  • Multiple exchangeable write modes
  • Vector and raster exposure mode

Specification

WRITE MODE I II III IV
Minimum Structure Size [μm] 0.6 1 2.5 5
Maximum write area (mm2) 50x50 100x100 125x125 125x125
Write Speed [mm2/minute] 1 5 35 90
Address Grid [nm] 20 40 100 200
Edge Roughness [3σ,nm] 100 120 200 400
Line Width Uniformity [3σ,nm] 150 200 400 800
Alignment Measurement Accuracy [3σ,nm] 200 200 400 800
A new user training: Mike Crosby and Alan Burton
Technical support: Mike Crosby and Alan Burton

Risk assessment

Risk Assessment for Returning to Work during the Covid-19 Lockdown Easing Period
developing_sample