Lithography Fume Cupboard

• Monmouth Scientific Circulaire T1400 filtration fume cupboard with carbon filter(Processing materials for lithographyonly)
• x2 hotplates
• Laurell spincoater WS-650Mz-8NPPB
• Ultrasonic bath
• High purity N2 gas
• DI water

Permitted substances:

1)Photoresists

2)Photoresists’ primers

3)Photoresists’ developers

4)Photoresists’ strippers

5)Acetone

6)Ethanol

7)IPA

8)DI water

Primers, photoresists, developers and removers:

• AZ ECI 3007 positive photoresistLink opens in a new windowLink opens in a new window
• AZ 5214 E image reversal photoresistLink opens in a new windowLink opens in a new window
• S1813 positive photoresist
• Protek and primer
• Hexamethyldisilazane (HMDS) primer
• AZ 326 MIF developer (TMAH based) X2
• Technistrip (lift-off)