Learning Outcomes

 

At the end of the course students should be able to:

• follow set procedures for the use of SEM and AFM
• be competent in standard sample preparation techniques such as sputter coating
• describe image formation and resolution limitations in electron and scanned probe microscopes
• understand the difference in electron optics between SEM and TEM
• relate the electron interaction processes to the image contrast they generate
• compare the use of contact mode and tapping mode AFM
• reflect upon the analysis capabilities of SEM, TEM and AFM

 

Syllabus

The detailed syllabus has not yet been decided. The lectures and practicals will follow the following format

Lectures

• EM1: Electron sources, optics, microscope alignment and electron/specimen interactions (JS)
• EM2: Electron-Specimen interactions (AS)
• EM3: SEM image formation, detectors, microanalysis and chemical mapping (RB)
• EM4: TEM contrast mechanism and image formation (RK)
• EM5: Advanced techniques and a look to the future of EM (JS)
• EM6: TEM and SEM practical issues and and specimen preparation (AS)
• AFM1: An introduction to atomic force microscopy (NW)
• AFM2: Practicalities - hardware, imaging modes and cantilevers (NW)
• AFM3: Theory - beams, forces and oscillations (NW)

 

Practicals

• AFM1: The AFM and contact mode (NW)
• AFM2: Tapping mode (NW)
• AFM3: Lithography and assessment (NW)

 

• SEM1: The SEM and basic operation (RB)
• SEM2: Detectors and analysis (RB)
• SEM3: Hands on and Monte-Carlo (RB)

 

• TEM1: The TEM and basic operation (JS)
• TEM2: Imaging in TEM (AS)
• TEM3: STEM (RK)

 

Assessment

Students will have a practical assessment on the final day of the course, and an oral interview roughly two weeks later.