Focussed Ion Beam Lithography (FIB)
Focused Ion Beam, also known as FIB, is a technique used particularly in the semiconductor and materials science fields for site-specific analysis, deposition, and ablation of materials.
How does it work?An FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM). However, while the SEM uses a focused beam of electrons to image the sample in the chamber, an FIB setup instead uses a focused beam of ions.
FIB can also be incorporated in a system with both electron and ion beam columns, allowing the same feature to be investigated using either of the beams. FIB should not be confused with using a beam of focused ions for direct write lithography (such as in proton beam writing), where the material is modified by different mechanisms.
TEM sample preparation; photolithography; defect analysis; etching; polishing and thinning.
Sample Handling Requirements:
Solid <150mm side dimensions.
Ion Polishing, SEM, TEM, AFM, STM.
Dr Ian Hancox, 024 76 150380 email i dot hancox at warwick dot ac dot uk.
Typical results format, and sample:
|Warwick collect/analyse data|
|Warwick collect data|
|Available to user with expertise/ contribution|
||Spare capacity for collaborative research|