As automation, AI and digital transformation become increasingly prevalent, with millions of terabytes of data processed daily worldwide, industry demand for high-performance, specialised computing and microchips is greater than ever. Warwick’s state-of-the-art Cleanroom facility allows industry users to push the boundaries of electronic device fabrication down to the nanoscale.

Challenges in industry

Microchips are prevalent in every aspect of modern life. They are a key part of any electronic device, consisting of millions or billions of interconnected electronic components that facilitate the flow of electric signals. Microchip components, called transistors, are layered on semiconductors and can be miniaturised or functionalised in different ways.

In a typical smartphone, you can expect to find 12 or more chips, responsible for managing features such as camera autofocus and 5G connectivity. From satellites and probes in outer space, to glucose monitoring patches and pacemakers in the human body, microchips are ubiquitous.

Over the last two decades, the field of microelectronics has seen leaps and bounds in advancements. Specialised silicon structures are constantly emerging: MEMS (micro-electromechanical systems) are found in gyroscopes in smartphones and CMOS (complementary-metal-oxide-semiconductors) are found in digital cameras. A recent advancement in semiconductor materials is Silicon Carbide or SiC, which overcomes many of the limitations of silicon. It provides ultra-high efficiency in high power applications, unparalleled resistance to extreme conditions, and the ability to handle much higher voltages.

The need for unparalleled precision in microelectronic design is vital for consistency and reliability in chip production. The minimum requirement for conceptualising and fabricating these tiny chips is specialised equipment that functions at the atomic level, in an environment monitored to have low levels of airborne particles, with constant temperature and humidity.

Work with Warwick to help you drive innovation

The University of Warwick’s 150 m² ISO class 6 Cleanroom has been at the forefront of SiC research for over 15 years and houses an extensive range of state-of-the-art equipment, enabling leaders in the microtechnology sector to push the boundaries of what is possible. Capabilities include:

• Lithography: Uses a thin beam of UV light to transfer intricate patterns onto wafers (a thin slice of semiconductor material) to determine the layout of components.
• Etching and wet processing: Allows the creation of precise features and connections through plasma, laser, or acid chemistries, selectively removing layers to achieve microstructures.
• Deposition: Plasma, laser, or electron beams deposit atomic-scale layers of oxide films or metals onto the surface of a wafer.
• Thermal oxidation and annealing: A thin layer of silicon dioxide grows on top of a wafer through a tightly controlled oxidation process, to protect against contamination.
• Metrology: A suite of measuring equipment is used to ensure quality control, process optimisation and precision characteristics.

Temperature and humidity are highly stable across the facility and air is filtered to ISO6 levels, with > 8320 1 µm particles per cubic metre, 1000 times better than normal environments.

For more detail on the Cleanroom equipment, see our Analytical Capability Guide.

Why Warwick?

Success stories at Warwick

The Warwick Cleanroom supports a spectrum of innovative projects, driving advancements in power electronics, materials science, and quantum technologies.

Contact Us

Get in touch to discuss how we can help solve your challenges. Contact Claire Gerard, Warwick Scientific Services Manager ( ) or visit the Cleanroom webpages.