New publication on direct thermal atomic layer deposition of high-κ dielectrics on monolayer molybdenum disulfide
"Direct thermal atomic layer deposition of high-κ dielectrics on monolayer MoS2: nucleation and growth" is out now in Nanoscale!
The group's work is largely experimental and focusses on electronic materials for a range of applications including photovoltaics, batteries, optoelectronics, power electronics, and modulation of terahertz radiation. We are interested in the materials science of defects in the bulk of crystalline materials and in controlling the properties of surfaces as the nanoscale. Materials of current interest include silicon, germanium, silicon carbide, and 2D transition metal dichalcogenides (particularly MoS2).
"Direct thermal atomic layer deposition of high-κ dielectrics on monolayer MoS2: nucleation and growth" is out now in Nanoscale!