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Structural Characterisation

Epitaxial growth of semiconductor materials is normally done in parallel with structural characterisation. These studies provide a feedback on the quality of the materials being grown, including:

  • Surface roughness and morphology, surface defects (AFM)
  • Compositions and relaxations of layers  (X-Ray Diffraction)
  • Epitaxial layer thickness and quality (TEM, XRR)
  • Electron diffraction and surface quality (RHEED, LEED)
  • Ion Scattering Techniques (LEIS, MEIS, HEIS)
  • Scanning Electron Microscopy (SEM)

Other structural characterisation is performed to understand the atomic structure of materials, or to profile the composition by depth.